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Advanced processes for 193-nm immersion lithography / Yayi Wei; Robert L. Brainard
Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Publisher: Bellingham, Wash : SPIE Press, 2009Description: XIX, 315 S. : graph. DarstISBN:- 9780819475572
- 621.381531
- TK7872.M3
- 1
| Item type | Home library | Collection | Shelving location | Call number | Status | Barcode | |
|---|---|---|---|---|---|---|---|
| Freihandbestand ausleihbar | Bibliothek Campus Süd | nach 8.23 | Lesesaal Technik (LST) | 2009 E 1444 | Available | 50006053090 |
Total holds: 0
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