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Advanced processes for 193-nm immersion lithography / Yayi Wei; Robert L. Brainard

By: Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Publisher: Bellingham, Wash : SPIE Press, 2009Description: XIX, 315 S. : graph. DarstISBN:
  • 9780819475572
Subject(s): DDC classification:
  • 621.381531
LOC classification:
  • TK7872.M3
Action note:
  • 1
Call number: Grundsignatur: 2009 E 1444PPN: PPN: 1624353975
Holdings
Item type Home library Collection Shelving location Call number Status Barcode
Freihandbestand ausleihbar Bibliothek Campus Süd nach 8.23 Lesesaal Technik (LST) 2009 E 1444 Available 50006053090
Total holds: 0

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