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Advanced Etch Technology for Nanopatterning VIII : 25-26 February 2019, San Jose, California, Unites States / Richard S. Wise, Catherine B. Labelle (editors) ; sponsored by: SPIE

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 10963Publisher: Bellingham, Washington, USA : SPIE, [2019]Description: 1 Online-Ressource : IllustrationenISBN:
  • 9781510625747
Other title:
  • SPIE Lithography
Subject(s): Genre/Form: Additional physical formats: 9781510625730 Online resources: PPN: PPN: 1667753266Package identifier: Produktsigel: ZDB-1-SPIE
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