A lithographer's guide to patterning CMOS devices with directed self-assembly / by Douglas J. Guerrero

Von:

Guerrero, Douglas, J [VerfasserIn]

Resource type: Ressourcentyp: Buch (Online)Buch (Online)Sprache: Englisch Reihen: SPIE spotlight ; vol. SL59Verlag: Bellingham : SPIE Press, [2020]Copyright-Datum: © 2020Beschreibung: 1 Online-Ressource (v, 26 Seiten) : Illustrationen, DiagrammeISBN:

9781510637016
9781510637016

Schlagwörter:

DDC-Klassifikation:

621.381531 23

DOI: DOI: 10.1117/3.2567441Online-Ressourcen:

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Zusammenfassung: This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed.Zusammenfassung: Preface -- 1. Introduction -- 2. Directed self-assembly and block copolymers -- 3. Process flows: 3.1. Graphoepitaxial flows; 3.2. Chemical-epitaxial flows -- 4. Combining grapho- and chemoepitaxial flows -- 5. Combining DSA with EUV lithography -- 6. Material modification for pattern transfer -- 7. Applications for device fabrication -- 8. Defectivity -- 9. Metrology -- 10. Summary -- References.PPN: PPN: 1725184559Package identifier: Produktsigel: ZDB-50-SPI | ZDB-50-SPI

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