Optical and EUV Nanolithography XXXVII : 26-29 February 2024, San Jose, California, United States / Martin Burkhardt, Claire van Lare (editors) ; sponsored by: SPIE

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Optical and EUV Nanolithography (Veranstaltung) : (2024 : San Jose, Calif.) [VerfasserIn]

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Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 12953 | SPIE. Proceedings of SPIE ; volume PC12953Publisher: Bellingham, Washington, USA : SPIE, [2024]Description: 2 Online-Ressourcen : IllustrationenISBN:

9781510672130

Other title:

SPIE Advanced Lithography Patterning

Subject(s):

Lithografie Halbleitertechnologie

Genre/Form:

Konferenzschrift

Additional physical formats: 9781510672123 Online resources:

Zugang im Netz des KIT

PPN: PPN: 1888249307Package identifier: Produktsigel: ZDB-1-SPIE

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