Optical and EUV Nanolithography XXXVII : 26-29 February 2024, San Jose, California, United States / Martin Burkhardt, Claire van Lare (editors) ; sponsored by: SPIE
Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 12953 | SPIE. Proceedings of SPIE ; volume PC12953Publisher: Bellingham, Washington, USA : SPIE, [2024]Description: 2 Online-Ressourcen : IllustrationenISBN:- 9781510672130
- SPIE Advanced Lithography Patterning
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