Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology : 16-18 April, Yokohama, Japan / Hiroshi Nakata (editor) ; organized by: Photomask Japan and SPIE

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(30. : Symposium on Photomask and Next-Generation Lithography Mask Technology (30. : 2024 : Yokohama) [VerfasserIn]

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Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 13177Publisher: Bellingham, Washington, USA : SPIE, [2024]Description: 1 Online-Ressource : IllustrationenISBN:

9781510680289

Other title:

30th Thirtieth PMJ NGL

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Konferenzschrift

Additional physical formats: 9781510680272 Online resources:

Zugang im Netz des KIT

PPN: PPN: 1903678412Package identifier: Produktsigel: ZDB-1-SPIE

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