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Photomask Technology 2024 : 30 September-3 October 2024, Monterey, California, United States / Seong-Sue Kim, Lawrence S. Melvin III (editors) ; sponsored by: SPIE, BACUS Photomask Technology Group

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 13216Publisher: Bellingham, Washington, USA : SPIE, [2024]Description: 1 Online-Ressource : IllustrationenISBN:
  • 9781510681583
Other title:
  • SPIE Lithography EUV EUVL
Subject(s): Genre/Form: Additional physical formats: 9781510681576 Online resources: PPN: PPN: 1910674672Package identifier: Produktsigel: ZDB-1-SPIE
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