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DTCO and Computational Patterning IV : 25-28 February 2025, San Jose, California, United States / Neal V. Lafferty, Harsha Grunes (editors) ; sponsored by: SPIE

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 13425Publisher: Bellingham, Washington, USA : SPIE, [2025]Description: 1 Online-Ressource : IllustrationenISBN:
  • 9781510686373
Other title:
  • SPIE Advanced Lithography
Genre/Form: Additional physical formats: 9781510686366 Online resources: PPN: PPN: 1926237382Package identifier: Produktsigel: ZDB-1-SPIE
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