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Plasma etching in semiconductor fabrication
Resource type: Ressourcentyp: BuchBookSeries: Plasma technology ; 1Publisher: Amsterdam [u.a.] : Elsevier, 1985Description: X, 316 S. : Ill., graph. DarstISBN:- 0444424199
- 621.3815/2
| Item type | Home library | Collection | Shelving location | Call number | Status | Barcode | |
|---|---|---|---|---|---|---|---|
| Freihandbestand ausleihbar | Bibliothek Campus Nord | nach 8.23 | Lesesaal CN | 2012 A 4318 | Available | 50948958090 | |
| Institutsbestand | IMS | Mo | Not for loan |
Total holds: 0