Ion implantation, sputtering and their applications / P. D. Townsend; J. C. Kelly; N. E. W. Hartley

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Contributor(s):

Resource type: Ressourcentyp: BuchBookLanguage: English Publisher: London [u.a.] : Acad. Pr., 1976Description: IX, 333 S. : Ill., graph. DarstISBN:

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DDC classification:

RVK: RVK: UP 9350LOC classification:

Call number: Grundsignatur: 77 A 169PPN: PPN: 022485074

Holdings
Item type	Home library	Collection	Shelving location	Call number	Copy number	Status	Barcode
Magazinbestand ausleihbar	Bibliothek Campus Süd		Geschlossenes Magazin	77 A 169		Available	47661966090
Freihandbestand Präsenznutzung	Fachbibliothek Physik	phys 7.14	Bibliothek / frei aufgestellt	77 A 169	;b	Not for loan	23168884
Institutsbestand	IMS			To		Not for loan

Total holds: 0