Custom cover image
Custom cover image

Computational lithography / Xu Ma and Gonzalo R. Arce

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: Wiley Series in Pure and Applied Optics Ser ; v.77 | Wiley series in pure and applied opticsPublisher: Hoboken, N.J : Wiley, c2010Edition: Online-AusgDescription: Online-Ressource (1 online resource (xv, 226 p.)) : illISBN:
  • 9781282755963
  • 128275596X
  • 9780470618936
Subject(s): Additional physical formats: 047059697X | 9780470596975 | 1282755501 | Erscheint auch als: Computational lithography. Druck-Ausgabe Hoboken, NJ : Wiley, 2010. XV, 226 S.DDC classification:
  • 621.381531
  • 621.3815/31 22
RVK: RVK: ZN 4170 | ZN 4904LOC classification:
  • TK7872.M3
Online resources: Summary: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guideSummary: Computational Lithography -- Contents -- Preface -- Acknowledgments -- Acronyms -- 1 Introduction -- 1.1 OPTICAL LITHOGRAPHY -- 1.1.1 Optical Lithography and Integrated Circuits -- 1.1.2 Brief History of Optical Lithography Systems -- 1.2 RAYLEIGH'S RESOLUTION -- 1.3 RESIST PROCESSES AND CHARACTERISTICS -- 1.4 TECHNIQUES IN COMPUTATIONAL LITHOGRAPHY -- 1.4.1 Optical Proximity Correction -- 1.4.2 Phase-Shifting Masks -- 1.4.3 Off-Axis Illumination -- 1.4.4 Second-Generation RETs -- 1.5 OUTLINE -- 2 Optical Lithography Systems -- 2.1 PARTIALLY COHERENT IMAGING SYSTEMS -- 2.1.1 Abbe's Model -- 2.1.2 Hopkins Diffraction Model -- 2.1.3 Coherent and Incoherent Imaging Systems -- 2.2 APPROXIMATION MODELS -- 2.2.1 Fourier Series Expansion Model -- 2.2.2 Singular Value Decomposition Model -- 2.2.3 Average Coherent Approximation Model -- 2.2.4 Discussion and Comparison -- 2.3 SUMMARY -- 3 Rule-Based Resolution Enhancement Techniques -- 3.1 RET TYPES -- 3.1.1 Rule-Based RETs -- 3.1.2 Model-Based RETs -- 3.1.3 Hybrid RETs -- 3.2 RULE-BASED OPC -- 3.2.1 Catastrophic OPC -- 3.2.2 One-Dimensional OPC -- 3.2.3 Line-Shortening Reduction OPC -- 3.2.4 Two-Dimensional OPC -- 3.3 RULE-BASED PSM -- 3.3.1 Dark-Field Application -- 3.3.2 Light-Field Application -- 3.4 RULE-BASED OAI -- 3.5 SUMMARY -- 4 Fundamentals of Optimization -- 4.1 DEFINITION AND CLASSIFICATION -- 4.1.1 Definitions in the Optimization Problem -- 4.1.2 Classification of Optimization Problems -- 4.2 UNCONSTRAINED OPTIMIZATION -- 4.2.1 Solution of Unconstrained Optimization Problem -- 4.2.2 Unconstrained Optimization Algorithms -- 4.3 SUMMARY -- 5 Computational Lithography with Coherent Illumination -- 5.1 PROBLEM FORMULATION -- 5.2 OPC OPTIMIZATION -- 5.2.1 OPC Design Algorithm -- 5.2.2 Simulations -- 5.3 TWO-PHASE PSM OPTIMIZATION -- 5.3.1 Two-Phase PSM Design Algorithm -- 5.3.2 Simulations.PPN: PPN: 808988026Package identifier: Produktsigel: ZDB-26-MYL | ZDB-30-PAD | ZDB-30-PQE
No physical items for this record
KIT – The University in the Helmholtz Association                         Home | Impressum | Datenschutz | Barrierefreiheit | KIT