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Surface and thin film analysis : a compendium of principles, instrumentation, and applications / edited by Gernot Friedbacher and Henning Bubert

Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Publisher: Weinheim : John Wiley & Sons, Incorporated, c2011Edition: 2nd, completely rev. and enlarged ed (Online-Ausg.)Description: Online-Ressource (1 online resource (xxiv, 533 p.)) : ill. (some col.)ISBN:
  • 9781283140942
  • 1283140942
  • 9783527636945
  • 9783527636938
Subject(s): Genre/Form: Additional physical formats: 9783527320479. | 1283140772 | 9783527320479 | Erscheint auch als: Surface and thin film analysis. Druck-Ausgabe. 2., compl. rev. and enl. ed. Weinheim : Wiley-VCH, 2011. XXIV, 533 S.DDC classification:
  • 620.44
  • 620/.44 23
  • 530.4275
RVK: RVK: ZM 7600 | ZM 7605 | UP 7500 | VE 7000LOC classification:
  • QC176.84.S93
Online resources: Summary: Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society).Summary: Intro -- Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications -- Contents -- Preface to the First Edition -- Preface to the Second Edition -- List of Contributors -- 1: Introduction -- Part One: Electron Detection -- 2: X-Ray Photoelectron Spectroscopy (XPS) -- 2.1 Principles -- 2.2 Instrumentation -- 2.2.1 Vacuum Requirements -- 2.2.2 X-Ray Sources -- 2.2.3 Synchrotron Radiation -- 2.2.4 Electron Energy Analyzers -- 2.2.5 Spatial Resolution -- 2.3 Spectral Information and Chemical Shifts -- 2.4 Quantification, Depth Profiling, and Imaging -- 2.4.1 Quantification -- 2.4.2 Depth Profiling -- 2.4.3 Imaging -- 2.5 The A uger Parameter -- 2.6 Applications -- 2.6.1 Catalysis -- 2.6.2 Polymers -- 2.6.3 Corrosion and Passivation -- 2.6.4 Adhesion -- 2.6.5 Superconductors -- 2.6.6 Semiconductors -- 2.7 Ultraviolet Photoelectron Spectroscopy (UPS) -- References -- 3: Auger Electron Spectroscopy (AES) -- 3.1 Principles -- 3.2 Instrumentation -- 3.2.1 Vacuum Requirements -- 3.2.2 Electron Sources -- 3.2.3 Electron-Energy Analyzers -- 3.3 Spectral Information -- 3.4 Quantification and Depth Profiling -- 3.4.1 Quantification -- 3.4.2 Depth Profiling -- 3.5 Applications -- 3.5.1 Grain Boundary Segregation -- 3.5.2 Semiconductor Technology -- 3.5.3 Thin Films and Interfaces -- 3.5.4 Surface Segregation -- 3.6 Scanning A uger Microscopy (SAM) -- References -- 4: Electron Energy-Loss Spectroscopy (EELS) and Energy-Filtering Transmission Electron Microscopy (EFTEM) -- 4.1 Principles -- 4.2 Instrumentation -- 4.3 Qualitative Spectral Information -- 4.3.1 Low-Loss Excitations -- 4.3.2 Ionization Losses -- 4.3.3 Fine Structures -- 4.4 Quantification -- 4.5 Imaging of Element Distribution -- 4.6 Summary -- References -- 5: Low-Energy Electron Diffraction (LEED) -- 5.1 Principles and History -- 5.2 Instrumentation.PPN: PPN: 809327155Package identifier: Produktsigel: ZDB-26-MYL | ZDB-30-PQE
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