Custom cover image
Custom cover image

Introduction to metrology applications in IC manufacturing / Bo Su; Eric Solecky; Alok Vaid

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: Tutorial texts in optical engineering ; 101Publisher: Bellingham, Wash. : SPIE Press, 2015Description: Online-RessourceISBN:
  • 9781628416626
Subject(s): Additional physical formats: 9781628418118 | Erscheint auch als: Introduction to metrology applications in IC manufacturing. Druck-Ausgabe Bellingham, Washington, USA : SPIE Press, 2015. XVIII, 164 S.DDC classification:
  • 621.3815 23
RVK: RVK: ZQ 3100LOC classification:
  • TK7874.58
DOI: DOI: 10.1117/3.2197207Online resources: Summary: Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracySummary: Preface -- Acknowledgments -- List of acronyms -- 1. Introduction -- 2. Metrology fundamentals: measurement system characterization and calibration using traditional definitions -- 3. Fundamental metrology: redefining measurement system analysis -- 4. Metrology in the semiconductor IC industry -- 5. Metrology toolsets in IC manufacturing: optical metrology -- 6. Metrology toolsets in IC manufacturing: charged-particle metrology systems -- 7. Metrology toolsets in IC manufacturing: additional metrology systems -- 8. Limitations of metrology techniques and hybrid metrology -- 9. Metrology in mask making -- 10. Perspectives on future challenges and considerations -- Appendix -- IndexPPN: PPN: 836416376Package identifier: Produktsigel: ZDB-50-SPI
No physical items for this record
KIT – The University in the Helmholtz Association                         Home | Impressum | Datenschutz | Barrierefreiheit | KIT