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Optical imaging in projection microlithography / Alfred Kwok-Kit Wong

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: Tutorial texts in optical engineering ; 66Publisher: Bellingham, Wash. <1000 20th St. Bellingham WA 98225-6705 USA> : SPIE, c2005Description: 1 online resource (xix, 254 p. : ill.)ISBN:
  • 9780819478702
  • 0819458295
  • 9780819458292
Subject(s): Additional physical formats: 0819458295. | 9780819458292. | Erscheint auch als: No title Druck-AusgabeDDC classification:
  • 621.381531
  • 621.3815/31 22
LOC classification:
  • TK7836
DOI: DOI: 10.1117/3.612961Online resources: Additional physical formats: Also available in print.Summary: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologistsSummary: 1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic lightSummary: 2. Elements of geometrical optics. 2.1. The eikonal equation -- 2.2. Light rays -- 2.3. Snell's law -- 2.4. Thin lens -- 2.5. Representation of an exposure systemSummary: 3. Elements of diffraction theory. 3.1. Qualitative consideration -- 3.2. Reciprocity -- 3.3. The Helmholtz-Kirchhoff theorem -- 3.4. Fresnel-Kirchhoff diffraction -- 3.5. The Rayleigh-Sommerfeld diffraction formula -- 3.6. Fraunhofer diffraction -- 3.7. Fraunhofer diffraction patternsSummary: 4. Imaging of extended objects with finite sources. 4.1. Coherent illumination -- 4.2. Obliquity factor -- 4.3. Spatial correlation of light -- 4.4. Köhler's illumination method -- 4.5. Partially coherent imagingSummary: 5. Resolution and image enhancement. 5.1. Image intensity spectrum -- 5.2. Binary intensity objects under on-axis illumination -- 5.3. Off-axis illumination -- 5.4. Attenuated phase-shifting mask -- 5.5. Alternating phase-shifting mask -- 5.6. Minimum half-pitch -- 5.7. Minimum dimensionSummary: 6. Oblique rays. 6.1. Polarization -- 6.2. Vector imaging -- 6.3. Wave propagation across a dielectric interface -- 6.4. Stratified media -- 6.5. Intensity distribution in photoresist -- 6.6. Immersion imaging -- 6.7. Imaging with oblique raysSummary: 7. Aberrations. 7.1. Diffraction of an aberrated wavefront -- 7.2. General properties of the aberration function -- 7.3. Zernike polynomials -- 7.4. Effects on imaging -- 7.5. MeasurementSummary: 8. Numerical computation. 8.1. Imaging equations -- 8.2. Transmission cross-coefficient integration -- 8.3. Source points integration -- 8.4. Coherent decomposition -- 8.5. Object spectrum -- 8.6. RemarksSummary: 9 Variabilities. 9.1. Categorization -- 9.2. Proximity effect -- 9.3. Object variabilities (photomask errors) -- 9.4. Polarization effects -- 9.5. Illumination -- 9.6. Pupil -- 9.7. Focus -- 9.8. Dose -- 9.9. Flare -- 9.10. RemarksSummary: A. Birefringence -- B. Stationarity and ergodicity -- C. Some Zernike polynomials -- D. Simulator accuracy tests -- E. Select refractive indexes -- F. Assorted theorems and identities -- Bibliography -- Solutions to exercises -- IndexPublication frequency: Erscheinungsweise: 1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic lightPPN: PPN: 1018189408Package identifier: Produktsigel: ZDB-50-SPI
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