Optical Microlithography XXXI : 27 February-1 March 2018, San Jose, California, Unites States / Jongwook Kye, Soichi Owa (editors) ; sponsored and published by: SPIE

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(31. : Optical Microlithography (Veranstaltung) (31. : 2018 : San Jose, Calif.) [VerfasserIn]

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Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 10587Publisher: Bellingham, Washington, USA : SPIE, [2018]Description: 1 Online-Ressource : IllustrationenISBN:

9781510616677

Other title:

SPIE Advanced Lithography International Symposium

Subject(s):

Lithografie Halbleitertechnologie

Genre/Form:

Konferenzschrift

Additional physical formats: 9781510616660 Online resources:

PPN: PPN: 1030374058Package identifier: Produktsigel: ZDB-1-SPIE

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