Custom cover image
Custom cover image

Advanced Etch Technology for Nanopatterning VII : 26-28 February 2018, San Jose, California, Unites States / Sebastian U. Engelmann, Richard S. Wise (editors) ; sponsored by: SPIE

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 10589Publisher: Bellingham, Washington, USA : SPIE, [2018]Description: 1 Online-Ressource : IllustrationenISBN:
  • 9781510616714
Other title:
  • SPIE Lithography Conference International Symposium
Subject(s): Genre/Form: Additional physical formats: 9781510616707 Online resources: PPN: PPN: 1030378037Package identifier: Produktsigel: ZDB-1-SPIE
No physical items for this record
KIT – The Research University in the Helmholtz Association                         Home | Impressum | Datenschutz | Barrierefreiheit | KIT