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Emerging Patterning Technologies : 27 February-1 March 2017, San Jose, California, United States / Christopher Bencher (editor) ; published by: SPIE

By: Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 10144Publisher: Bellingham, Washington, USA : SPIE, [2017]Description: 1 Online-Ressource : IllustrationenISBN:
  • 9781510607408
Other title:
  • SPIE Advanced Lithography
Subject(s): Genre/Form: Additional physical formats: 9781510607392 | Erscheint auch als: Emerging Patterning Technologies. Druck-Ausgabe Bellingham, Washington, USA : SPIE, 2017. circa 160 verschieden gezählte SeitenOnline resources: PPN: PPN: 1042493375Package identifier: Produktsigel: ZDB-1-SPIE
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