33rd European Mask and Lithography Conference : 26-28 June 2017, Dresden, Germany / Uwe F.W. Behringer, Jo Finders (editors) ; organized by: VDE/VDI GMM - the Society for Microelectronics, Microsystems and Precision Engineering (Germany) ; published by: SPIE
Contributor(s): Resource type: Ressourcentyp: Buch (Online)Book (Online)Language: English Series: SPIE. Proceedings of SPIE ; volume 10446Publisher: Bellingham, Washington, USA : SPIE, [2017]Description: 1 Online-Ressource : IllustrationenISBN:- 9781510613577
- Thirty-third EMCL
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