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Glow discharge processes : sputtering and plasma etching / Brian N. Chapman

By: Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Series: A Wiley interscience publicationPublisher: New York, NY [u.a.] : Wiley, 1980Description: XV, 406 S : graph. DarstISBN:
  • 9780471078289
  • 047107828X
Subject(s): DDC classification:
  • 537.5/2
  • 537.52
RVK: RVK: ZN 4150 | ZN 3400 | UR 8000 | UR 6000LOC classification:
  • QC702.7.P6
Call number: Grundsignatur: 80 A 4214PPN: PPN: 025258435
Holdings
Item type Home library Collection Shelving location Call number Copy number Status Date due Barcode Item holds
Freihandbestand ausleihbar Bibliothek Campus Nord werk 2.1 Lesesaal CN 80 A 4214 ;b Available 50574265090
Magazinbestand ausleihbar Bibliothek Campus Süd Geschlossenes Magazin 80 A 4214 Available 45724166090
Total holds: 0
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