Glow discharge processes : sputtering and plasma etching / Brian N. Chapman
Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Series: A Wiley interscience publicationPublisher: New York, NY [u.a.] : Wiley, 1980Description: XV, 406 S : graph. DarstISBN:- 9780471078289
- 047107828X
- 537.5/2
- 537.52
- QC702.7.P6
Item type | Home library | Collection | Shelving location | Call number | Copy number | Status | Date due | Barcode | Item holds | |
---|---|---|---|---|---|---|---|---|---|---|
Freihandbestand ausleihbar | Bibliothek Campus Nord | werk 2.1 | Lesesaal CN | 80 A 4214 | ;b | Available | 50574265090 | |||
Magazinbestand ausleihbar | Bibliothek Campus Süd | Geschlossenes Magazin | 80 A 4214 | Available | 45724166090 |
Total holds: 0