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Materials for microlithography : radiation-sensitive polymers ; based on a symposium cosponsored by the Division of Polymeric Materials Science and Engineering and the Division of Polymer Chemistry at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8 - 13, 1984 / L. F. Thompson, ed. ...
Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Series: American Chemical Society. ACS symposium series ; 266Publisher: Washington, DC : American Chemical Society, 1984Description: VIII, 494 S : Ill., graph. DarstISBN:- 0841208719
- 621.381/73
- 621.38173
| Item type | Home library | Shelving location | Call number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|---|
| Magazinbestand ausleihbar | Bibliothek Campus Süd | Geschlossenes Magazin | 85 A 228 | Available | 47669562090 |
Total holds: 0