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Materials for microlithography : radiation-sensitive polymers ; based on a symposium cosponsored by the Division of Polymeric Materials Science and Engineering and the Division of Polymer Chemistry at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8 - 13, 1984 / L. F. Thompson, ed. ...

Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Series: American Chemical Society. ACS symposium series ; 266Publisher: Washington, DC : American Chemical Society, 1984Description: VIII, 494 S : Ill., graph. DarstISBN:
  • 0841208719
Subject(s): Genre/Form: DDC classification:
  • 621.381/73
  • 621.38173
Call number: Grundsignatur: 85 A 228PPN: PPN: 025272934
Holdings
Item type Home library Shelving location Call number Status Date due Barcode Item holds
Magazinbestand ausleihbar Bibliothek Campus Süd Geschlossenes Magazin 85 A 228 Available 47669562090
Total holds: 0

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