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Plasma sources for thin film deposition and etching / ed. by Maurice H. Francombe ...

Contributor(s): Resource type: Ressourcentyp: BuchBookLanguage: English Series: Physics of thin films ; 18Publisher: San Diego [u.a.] : Acad. Press, 1994Description: XII, 328 S. : Ill., graph. DarstISBN:
  • 0125330189
Subject(s): Genre/Form: DDC classification:
  • 530.82
RVK: RVK: UP 7500Action note:
  • 3
Summary: Lieberman, Michael A.; Design of high-density plasma sources for materials processingSummary: Popov, Oleg A.; Electron cyclotron resonance plasma sources and their use in plasma-assisted chemical vapor deposition of thin filmsSummary: Rohde, Suzanne L.; Unbalanced magnetron sputteringSummary: Steinbrüchel, Christoph; The formation of particles in thin-film processing plasmasCall number: Grundsignatur: V A 9331-18PPN: PPN: 04349613X
Holdings
Item type Home library Collection Shelving location Call number Status Barcode
Freihandbestand Präsenznutzung Fachbibliothek Physik phys 8.71 Bibliothek / frei aufgestellt V A 9331-18 Not for loan 40347657
Total holds: 0

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