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Photoresist : materials and processes / W. S. DeForest
Resource type: Ressourcentyp: BuchBookLanguage: English Publisher: New York [u.a.] : McGraw-Hill, 1975Description: XI, 269 S. : Ill., graph. DarstISBN:- 0070162301
- 621.381/73
| Item type | Home library | Shelving location | Call number | Status | Barcode | |
|---|---|---|---|---|---|---|
| Magazinbestand ausleihbar | Bibliothek Campus Süd | Geschlossenes Magazin | 75 A 1355 | Available | 47638841090 | |
| Institutsbestand | IMS | De | Not for loan |
Total holds: 0